Gottlieb Oehrlein

Professor at Physics, University of Maryland-College Park0 Followers

Dr. Gottlieb Oehrlein leads initiatives in the Department of Physics at the University of Maryland, where he serves as an Affiliate Professor. With his office nestled in Room 2119 of the Chemical & Nuclear Engineering Building, Dr. Oehrlein is a pivotal figure within the academic community. His role involves engaging with students and colleagues, fostering an environment of learning and collaboration. While his specific research interests remain unspecified, Dr. Oehrlein's presence at the University of Maryland underscores his commitment to advancing the field of physics. His contributions to the department are marked by his involvement in various academic activities and his support for the university's mission to promote scientific inquiry and education.

Research Interests

Plasma physics surface science materials processing thin film deposition

Publications

1 - Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication,Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Gottlieb S. Oehrlein , Raymond J. Phaneuf , David B. Graves ,

, 2011-01-01

2 - Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Chen Li , Rahul Gupta , Venkateswara Pallem , Gottlieb S. Oehrlein ,

, 2016-04-04

3 - Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Xi Li , Li Ling , Xuefeng Hua , Masanaga Fukasawa , Gottlieb S. Oehrlein , Marcos Barela , Harold M. Anderson ,

, 284-293, 2002-12-20

4 - Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment,Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Chen Li , Thorsten Hofmann , Klaus Edinger , Valery Godyak , Gottlieb S. Oehrlein ,

, 2020-04-09

5 - Characteristics of C4F8 plasmas with Ar, Ne, and He additives for SiO2 etching in an inductively coupled plasma (ICP) reactor,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Xi Li , Li Ling , Xuefeng Hua , Gottlieb S. Oehrlein , Yicheng Wang , H. M. Anderson ,

, 1955-1963, 2003-10-14

6 - (Invited) Atomic Layer Etching of SiO2 and Other Materials Using Plasma Process Sequences,ECS Meeting Abstracts

Gottlieb S. Oehrlein ,

, 1269-1269, 2017-04-15

7 - Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Gottlieb S. Oehrlein , Young H. Lee ,

, 1585-1594, 1987-07-01

8 - Characterization of plasma catalytic decomposition of methane: role of atomic O and reaction mechanism,Journal of Physics D: Applied Physics

Yudong Li , Jingkai Jiang , Michael Hinshelwood , Shiqiang Zhang , Peter J Bruggeman , Gottlieb S Oehrlein ,

, 155204, 2022-01-21

9 - On the photoresist stripping and damage of ultralow k dielectric materials using remote H2- and D2-based discharges,Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Guido J. Stueber , Gottlieb S. Oehrlein , P. Lazzeri , M. Bersani , M. Anderle , Eric Busch , Richard McGowan ,

, 1593-1602, 2007-08-17

10 - (Invited) Materials Selectivity in Atomic Layer Etching of SiO2, Si, and Si3N4 Using Plasma Process Sequences,ECS Meeting Abstracts

Gottlieb S. Oehrlein ,

, 1086-1086, 2017-09-01

11 - Plasma catalysis: separating plasma and surface contributions for an Ar/N2/O2 atmospheric discharge interacting with a Pt catalyst,Plasma Sources Science and Technology

Michael Hinshelwood , Gottlieb S Oehrlein ,

, 125001, 2023-12-01

12 - Polystyrene as a model system to probe the impact of ambient gas chemistry on polymer surface modifications using remote atmospheric pressure plasma under well-controlled conditions,Biointerphases

Elliot A. J. Bartis , Pingshan Luan , Andrew J. Knoll , Connor Hart , Joonil Seog , Gottlieb S. Oehrlein ,

, 2015-04-30

13 - Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Chen Li , Valery Godyak , Thorsten Hofmann , Klaus Edinger , Gottlieb S. Oehrlein ,

, 2020-03-06

14 - Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing,Journal of Vacuum Science & Technology B

Sang-Jin Chung , Pingshan Luan , Minjoon Park , Andrew Metz , Gottlieb S. Oehrlein ,

, 2023-09-25

15 - Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma,The Journal of Chemical Physics

Dominik Metzler , Chen Li , Sebastian Engelmann , Robert L. Bruce , Eric A. Joseph , Gottlieb S. Oehrlein ,

, 2016-09-08

16 - Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4,Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Chen Li , Dominik Metzler , Chiukin Steven Lai , Eric A. Hudson , Gottlieb S. Oehrlein ,

, 2016-07-01

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