Robert Brainard

Professor Robert Brainard is a distinguished figure contributing to global discussions on advanced materials for nanotechnology applications. As a Professor of Nanoscale Science & Engineering at the University at Albany, he brings a wealth of expertise in the design, synthesis, and characterization of new molecules and polymers. His research is primarily centered on photoresists, with a particular focus on novel materials and exposure mechanisms for Extreme Ultraviolet (EUV) lithography. Dr. Brainard's work has significantly advanced the understanding of the chemistry involved in EUV exposure. His pioneering efforts in developing new photoacid generators (PAGs) have been instrumental in enhancing the performance and efficiency of EUV photoresists. These innovations have not only improved the functionality of photoresists but have also opened new avenues for their application in various technological fields. In addition to his work on EUV lithography, Dr. Brainard is also exploring the potential of self-assembling polymers for biological applications. His research in this area aims to harness the unique properties of these materials to develop new solutions for complex biological challenges. This interdisciplinary approach underscores his commitment to pushing the boundaries of materials science and engineering. Dr. Brainard's contributions to the field are well-documented through his numerous publications in high-impact journals and a series of patents that highlight his innovative approaches. His work is widely recognized and respected within the scientific community, earning him a reputation as a leading expert in the field of EUV photoresists. Beyond his research, Dr. Brainard is dedicated to mentoring the next generation of scientists and engineers. He actively engages with students and colleagues, fostering an environment of collaboration and innovation. His commitment to education and research excellence continues to inspire those around him, making a lasting impact on the field of materials science and engineering.